Microstructure Formation within Films of Silicon using Electrochemical Anodization
نویسندگان
چکیده
منابع مشابه
Plasma anodization of silicon at room temperature
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متن کاملPlasma-assisted oxidation, anodization, and nitridation of silicon
Plasma-assisted oxidation, anodization, and nitridation of silicon have been performed in microwave, rf, and dc plasmas with a variety of reactor configurations and a range of plasma densities. Compared to thermal processes at equivalent substrate temperatures, film growth rates are accelerated by the plasma-enhanced generation of reactive chemical species or by the presence of electric fields ...
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ژورنال
عنوان ژورنال: Transactions of the Materials Research Society of Japan
سال: 2010
ISSN: 1382-3469,2188-1650
DOI: 10.14723/tmrsj.35.69